{"id":1043,"date":"2026-01-30T07:51:55","date_gmt":"2026-01-30T07:51:55","guid":{"rendered":"https:\/\/cpam.iitmandi.ac.in\/?page_id=1043"},"modified":"2026-02-08T06:50:58","modified_gmt":"2026-02-08T06:50:58","slug":"direct-laser-lithography-system","status":"publish","type":"page","link":"https:\/\/cpam.iitmandi.ac.in\/?page_id=1043","title":{"rendered":"Direct Laser Lithography System"},"content":{"rendered":"\t\t
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\r\n CENTER FOR PROMOTION OF ADDITIVE MANUFACTURING: RENEWABLE ENERGY & DISTRIBUTIVE MANUFACTURING USING CUSTOMIZED 4D & 3D TECHNOLOGIES (CPAM: RE & DM)\r\n <\/div>\r\n<\/div>\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t
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Direct Laser Lithography System<\/h2>\t\t\t\t<\/div>\n\t\t\t\t
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Model: \u00b5Laser |<\/span> Manufacturer: Mutech Microsystems (Argentina)<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t

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|<\/span> Overview<\/h2>\t\t\t\t<\/div>\n\t\t\t\t
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The \u00b5Laser<\/strong>\u00a0by Mutech Microsystems<\/strong> is a direct laser lithography writer designed for microfabrication<\/strong> research and prototyping. Using a precision 405 nm laser<\/strong> and industry-standard\u00a0optics, it patterns photosensitive resist at high resolution across large areas, enabling in-house creation of photomasks, micro-devices, and research prototypes.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t

\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t\"\u00b5Laser\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t
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|<\/span> Key Features<\/h2>\t\t\t\t<\/div>\n\t\t\t\t
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Fabrication Technology <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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Direct laser lithography using a focused 405 nm diode laser – \u00b5Laser writes directly on photoresist without masks, reducing fabrication time and costs. Direct lithography enables versatile prototyping from photomasks to functional microstructures.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Laser Source <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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405 nm diode laser (optionally 375 nm) – The UV laser source offers fine energy deposition suitable for high-resolution patterning. An optional 375 nm source expands compatibility with additional resist chemistries.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Minimum Feature Size <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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3-5 \u00b5m realistic feature capability – Minimum feature sizes vary with optics and substrate, enabling fine micro-patterning. This resolution suits microfluidics, MEMS,
and basic microelectronics prototyping.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Writing Area <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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Up to 100 \u00d7 92 mm\u00b2 large writing field – The generous write area supports full-size photomask patterning or large microstructures. It enables broad substrate coverage without stitching or repositioning.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Positioning & Stage <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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High-precision XY motion with nm-level steps – The stage offers unidirectional steps of X = 0.16<\/strong> \u00b5m and Y = 1.00<\/strong> \u00b5m for fine control. Multi-layer alignment accuracy can be improved with an optional rotary stage (5-10 \u00b5m)<\/strong>.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Optics & Focusing <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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Confocal microscope with integrated camera and yellow illumination – Microscope optics ensure accurate focusing and alignment before writing. Industry standard objectives allow spot size adjustment for different resolutions.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Software & File Support <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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User-friendly control with PNG and GDSII import – Software supports design transformations including rotation, reflection, scaling, and borders. It enables multi-design printing and compensates for substrate tilt\/curvature.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Writing Speed & Modes <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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100-120 mm\/s typical writing speed – Combined with multiple optics, this enables efficient throughput on large areas. Supports both unidirectional and bidirectiona writing for optimized patterns.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t

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Applications <\/div><\/span>\n\t\t\t\t\t\t\t\n\t\t\t<\/path><\/svg><\/span>\n\t\t\t<\/path><\/svg><\/span>\n\t\t<\/span>\n\n\t\t\t\t\t\t<\/summary>\n\t\t\t\t
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Photomask fabrication, research prototype patterning, microfluidics, microelectronics, micromechanics, sensor structures, and material science research. Ideal for universities and R&D facilities developing custom microdevices and prototypes. The integrated vision and alignment system simplifies pattern registration on pre-existing features.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"

CENTER FOR PROMOTION OF ADDITIVE MANUFACTURING: RENEWABLE ENERGY & DISTRIBUTIVE MANUFACTURING USING CUSTOMIZED 4D & 3D TECHNOLOGIES (CPAM: RE & DM) Direct Laser Lithography System Model: \u00b5Laser | Manufacturer: Mutech Microsystems (Argentina) | Overview The \u00b5Laser\u00a0by Mutech Microsystems is a direct laser lithography writer designed for microfabrication research and prototyping. Using a precision 405 nm […]<\/p>\n","protected":false},"author":1,"featured_media":1038,"parent":309,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"elementor_header_footer","meta":{"ocean_post_layout":"","ocean_both_sidebars_style":"","ocean_both_sidebars_content_width":0,"ocean_both_sidebars_sidebars_width":0,"ocean_sidebar":"","ocean_second_sidebar":"","ocean_disable_margins":"enable","ocean_add_body_class":"","ocean_shortcode_before_top_bar":"","ocean_shortcode_after_top_bar":"","ocean_shortcode_before_header":"","ocean_shortcode_after_header":"","ocean_has_shortcode":"","ocean_shortcode_after_title":"","ocean_shortcode_before_footer_widgets":"","ocean_shortcode_after_footer_widgets":"","ocean_shortcode_before_footer_bottom":"","ocean_shortcode_after_footer_bottom":"","ocean_display_top_bar":"default","ocean_display_header":"default","ocean_header_style":"","ocean_center_header_left_menu":"","ocean_custom_header_template":"","ocean_custom_logo":0,"ocean_custom_retina_logo":0,"ocean_custom_logo_max_width":0,"ocean_custom_logo_tablet_max_width":0,"ocean_custom_logo_mobile_max_width":0,"ocean_custom_logo_max_height":0,"ocean_custom_logo_tablet_max_height":0,"ocean_custom_logo_mobile_max_height":0,"ocean_header_custom_menu":"","ocean_menu_typo_font_family":"","ocean_menu_typo_font_subset":"","ocean_menu_typo_font_size":0,"ocean_menu_typo_font_size_tablet":0,"ocean_menu_typo_font_size_mobile":0,"ocean_menu_typo_font_size_unit":"px","ocean_menu_typo_font_weight":"","ocean_menu_typo_font_weight_tablet":"","ocean_menu_typo_font_weight_mobile":"","ocean_menu_typo_transform":"","ocean_menu_typo_transform_tablet":"","ocean_menu_typo_transform_mobile":"","ocean_menu_typo_line_height":0,"ocean_menu_typo_line_height_tablet":0,"ocean_menu_typo_line_height_mobile":0,"ocean_menu_typo_line_height_unit":"","ocean_menu_typo_spacing":0,"ocean_menu_typo_spacing_tablet":0,"ocean_menu_typo_spacing_mobile":0,"ocean_menu_typo_spacing_unit":"","ocean_menu_link_color":"","ocean_menu_link_color_hover":"","ocean_menu_link_color_active":"","ocean_menu_link_background":"","ocean_menu_link_hover_background":"","ocean_menu_link_active_background":"","ocean_menu_social_links_bg":"","ocean_menu_social_hover_links_bg":"","ocean_menu_social_links_color":"","ocean_menu_social_hover_links_color":"","ocean_disable_title":"default","ocean_disable_heading":"default","ocean_post_title":"","ocean_post_subheading":"","ocean_post_title_style":"","ocean_post_title_background_color":"","ocean_post_title_background":0,"ocean_post_title_bg_image_position":"","ocean_post_title_bg_image_attachment":"","ocean_post_title_bg_image_repeat":"","ocean_post_title_bg_image_size":"","ocean_post_title_height":0,"ocean_post_title_bg_overlay":0.5,"ocean_post_title_bg_overlay_color":"","ocean_disable_breadcrumbs":"default","ocean_breadcrumbs_color":"","ocean_breadcrumbs_separator_color":"","ocean_breadcrumbs_links_color":"","ocean_breadcrumbs_links_hover_color":"","ocean_display_footer_widgets":"default","ocean_display_footer_bottom":"default","ocean_custom_footer_template":"","footnotes":""},"class_list":["post-1043","page","type-page","status-publish","has-post-thumbnail","hentry","entry","has-media"],"_links":{"self":[{"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1043","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=1043"}],"version-history":[{"count":33,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1043\/revisions"}],"predecessor-version":[{"id":1268,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1043\/revisions\/1268"}],"up":[{"embeddable":true,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/309"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/media\/1038"}],"wp:attachment":[{"href":"https:\/\/cpam.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=1043"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}